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首页> 外文期刊>IEEE Transactions on Nuclear Science >Proton radiation damage in p-channel CCDs fabricated on high-resistivity silicon
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Proton radiation damage in p-channel CCDs fabricated on high-resistivity silicon

机译:在高电阻率硅上制造的p沟道CCD中的质子辐射损伤

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摘要

P-channel backside illuminated silicon charge-coupled devices (CCDs) were developed and fabricated on high-resistivity n-type silicon. The devices have been exposed up to 1 /spl times/ 10/sup 11/ protons/cm/sup 2/ at 12 MeV. The charge transfer efficiency and dark current were measured as a function of radiation dose. These CCDs were found to be significantly more radiation tolerant than conventional n-channel devices. This could prove to be a major benefit for space missions of long duration.
机译:在高电阻率的n型硅上开发并制造了P沟道背面照明的硅电荷耦合器件(CCD)。器件在12 MeV下的暴露速度高达1 / spl次/ 10 / sup 11 /质子/ cm / sup 2 /。电荷转移效率和暗电流被测量为辐射剂量的函数。发现这些CCD比常规的n通道设备具有更高的辐射耐受性。对于长时间的太空飞行,这可能被证明是一项重大好处。

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