Metal polymer multiscale material formed by arranging metal nanoparticles in self patterned spin-on films

摘要

Self-patterned polymer films formed by PEGA/PMMA and PVP/PMMA mixtures were generated during spin coating of silicon chips. PVP/PMMA films were applied for arranging gold/silver-core/shell nanoparticles on the film surfaces. The method of spontaneous demixing during spin coating was applied for formation of self-patterned polymer films. A fast demixing is caused by the fast evaporation of ethanol in the final phase of spin-on deposition. It results in the formation of polymer domains with a typical size in the lower micrometer range. The application of aqueous colloidal solution of metal nanoparticles leads to a preferential bonding of the hydrophilic nanoparticles in the PVP domains of self patterned PMMA/PVP films. By this method patterned surface films of metals could be generated without application of lithographic techniques