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Multifunctional III-nitridedilute magnetic semiconductor epilayers and nanostructures as a future platform for spintronic devices

机译:多功能III-氮化-稀磁性半导体外延层和纳米结构作为自旋电子器件的未来平台

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This work focuses on the development of materials and growth techniques suitable for future spintronic device applications. Metal-organic chemical vapor deposition (MOCVD) was used to grow high-quality epitaxial films of varying thickness and manganese doping levels by introducing bis-cyclopentadienyl as the manganese source. High-resolution X-ray diffraction indicates that no macroscopic second phases are formed during growth, and Mn containing films are similar in crystalline quality to undoped films Atomic force microscopy revealed a 2-dimensional MOCVD step-flow growth pattern in the Mn-incorporated samples. The mean surface roughnesses of optimally grown Ga_(1-x)Mn_xN films were almost identical to that from the as-grown template layers, with no change in growth mechanism or morphology. Various annealing steps were applied to some of the samples to reduce compensating defects and to investigate the effects of post processing on the structural, magnetic and opto-electronic properties. SQUID measurements showed an apparent ferromagnetic hysteresis behavior which persisted to room temperature. An optical absorption band around 1.5eV was observed via transmission studies. This band is assigned to the internal Mn~(3+) transition between the ~5E and the partially filled ~5T_2 levels of the ~5D state. The broadening of the absorption band is introduced by the high Mn concentration. Recharging of the Mn~(3+) to Mn~(2+) was found to effectively suppress these transitions resulting in a reduction of the magnetization. The structural quality, and the presence of Mn~(2+) ions were confirmed by EPR spectroscopy, meanwhile no Mn-Mn interactions indicative of clustering were observed. The absence of doping-induced strain in Ga_(1-x)Mn_xN was observed by Raman spectroscopy.
机译:这项工作专注于开发适合未来自旋电子器件应用的材料和生长技术。金属有机化学气相沉积(MOCVD)用于通过引入双环戊二烯基作为锰源来生长厚度和锰掺杂水平不同的高质量外延膜。高分辨率X射线衍射表明,在生长过程中没有形成宏观的第二相,并且含Mn的薄膜的晶体质量与未掺杂的薄膜相似。原子力显微镜揭示了含Mn的样品中的二维MOCVD阶梯流生长模式。最佳生长的Ga_(1-x)Mn_xN薄膜的平均表面粗糙度与刚生长的模板层的平均表面粗糙度几乎相同,且生长机理或形态没有变化。对某些样品采用了各种退火步骤,以减少补偿缺陷并研究后处理对结构,磁和光电性能的影响。 SQUID测量显示出明显的铁磁磁滞行为,并持续到室温。通过透射研究观察到约1.5eV的光吸收带。该谱带被分配到〜5E和〜5D状态的部分填充的〜5T_2能级之间的内部Mn〜(3+)跃迁。高Mn浓度会导致吸收带变宽。发现将Mn〜(3+)再充电为Mn〜(2+)可有效抑制这些转变,从而降低磁化强度。 EPR光谱证实了结构质量和Mn〜(2+)离子的存在,同时未观察到表明聚集的Mn-Mn相互作用。通过拉曼光谱观察到Ga_(1-x)Mn_xN中不存在掺杂诱导的应变。

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