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Development of immersion sn plating process for low-alpha bump formation

机译:用于低α凸点形成的浸镀锡电镀工艺的发展

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As the flip-chip bump process becomes smaller pitched and lead free, several materials have been introduced for UBM preparation on substrate. Au/Ni/Cu and OSP are well known candidates, but it is also known that they have some concerns such as higher cost
机译:随着倒装芯片凸点工艺的节距变小和无铅化,已经引入了几种在基板上制备UBM的材料。 Au / Ni / Cu和OSP是众所周知的候选材料,但也众所周知它们存在一些问题,例如成本较高

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