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Reducing symmetric polarization aberrations in a molded glass lens by annealing

机译:通过退火降低模制玻璃透镜中的对称偏振像差

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Mueller matrix imaging polarimetry was used to study stress in a series of a high numerical aperture molded glass lenses. An interesting radially symmetric retardance was found which resembled the polarization aberration induced by coatings. Upon investigation the source of the polarization aberration is traced to a remarkably symmetric radial stress birefringence in the glass believed to arise during fire-polishing of the surfaces. While annealing the lenses relieves much of the stress birefringence, reducing the retardance of the lenses by a factor of five, the lenses remained unusable for critical polarization applications.
机译:Mueller矩阵成像偏振法用于研究一系列高数值孔径模制玻璃透镜中的应力。发现了有趣的径向对称延迟,该延迟类似于由涂层引起的偏振像差。经研究,偏振像差的来源可追溯到玻璃中明显对称的径向应力双折射,据信这是在表面火抛光期间产生的。虽然对镜片进行退火可以缓解大部分应力双折射,将镜片的延迟降低五倍,但镜片仍无法用于临界偏振应用。

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