School of Advanced Materials Science and Engineering, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon, Gyeonggi-do, 440-746, Republic of Korea;
School of Advanced Materials Science and Engineering, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon, Gyeonggi-do, 440-746, Republic of Korea;
School of Advanced Materials Science and Engineering, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon, Gyeonggi-do, 440-746, Republic of Korea;
School of Advanced Materials Science and Engineering, Sungkyunkwan University, 300 Cheoncheon-dong, Jangan-gu, Suwon, Gyeonggi-do, 440-746, Republic of Korea;
ZnO thin-film-transistors; sputtering; post-annealing;
机译:室温下生长的沟道层的热退火温度对ZnO薄膜晶体管中器件性能的影响
机译:室温下生长的沟道层的热退火温度对ZnO薄膜晶体管中器件性能的影响
机译:退火温度对水热生长在ZnO:Al种子层上的ZnO纳米棒的光致发光的影响
机译:在室温下生长的通道层的热退火温度对ZnO薄膜晶体管的装置性能
机译:退火温度对Sol-Gel ZnO薄膜力学性能的影响。
机译:基材工艺条件和生长ZnO薄膜性能的底蛋白温度通过连续的离子层吸附和反应方法
机译:热化学沉积的ZnO纳米结构:沉积后退火温度对pH传感器性能的影响