High-energy photon lithography for fabrication of photonic devices

摘要

Abstract: Photonic crystals an other photonic devices could be efficiently produced using relatively simple and cheap Plasma Focus Pinch x-ray point sources, similar to the NX2. With this point x-ray source, it was demonstrated that with a proximity printing scheme, feature sizes less than 100 nm could be reproduced in a 500 nm UV3 CAR layer. !7