Semiconductor Manufacturing International Corporation 18 Zhangjiang Road, Pudong New Area, Shanghai, P.R.C. 201203;
Semiconductor Manufacturing International Corporation 18 Zhangjiang Road, Pudong New Area, Shanghai, P.R.C. 201203;
Semiconductor Manufacturing International Corporation 18 Zhangjiang Road, Pudong New Area, Shanghai, P.R.C. 201203;
Semiconductor Manufacturing International Corporation 18 Zhangjiang Road, Pudong New Area, Shanghai, P.R.C. 201203;
Semiconductor Manufacturing International Corporation 18 Zhangjiang Road, Pudong New Area, Shanghai, P.R.C. 201203;
Semiconductor Manufacturing International Corporation 18 Zhangjiang Road, Pudong New Area, Shanghai, P.R.C. 201203;
OPC model; photomask; pattern generator; sigma7500; deep-UV;
机译:使用空白检查,图案化掩模检查和晶圆检查来评估极端紫外线掩模缺陷
机译:65nm逻辑门CPL掩模的数据库检查
机译:通过金属有机化学气相沉积法在图案化的Al / Ti金属掩模上生长GaN层
机译:Sigma7500模式发生器的掩模和晶片评估应用于65nm逻辑金属和通过层
机译:镶嵌图案化的金属/胶粘剂晶圆键合,用于三维集成。
机译:MOVPE在晶圆级厚氮化硼层上的柔性金属-半导体-金属器件原型
机译:金属硬质面罩采用Cu / Low k薄膜后灰和湿式清洁工艺优化并集成到65nm制造流程中