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Copper Doped ZnO Thin Film for Ultraviolet Photodetector with Enhanced Photosensitivity

机译:用于紫外光电探测器的铜掺杂ZnO薄膜,具有增强的光敏性

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Ultraviolet photoconductivity in Copper doped ZnO (Cu:ZnO) thin films synthesized by sol-gel technique is investigated. Response characteristics of Pure ZnO thin film and Cu:ZnO thin film UV photodetector with 1.3 at. wt % Cu doping biased at 5 V for UV radiation of λ = 365 nm and intensity = 24 μwatt/cm~2 has been studied. Cu:ZnO UV photodetector is found to exhibit a high photocoductive gain (K = 1.5×10~4) with fast recovery (T_(90%) = 23s) in comparison to pure ZnO thin film based photodetector (K = 4.9×10~1 and T_(90%) = 41s). Cu~(2+) ions have been substituted in ZnO lattice which has been confirmed by X-ray diffraction (XRD) and Raman spectroscopy leading to lowering of dark current (I_(off) ~ 1.44 nA). Upon UV illumination, more electron hole pairs are generated in the photodetector due to the high porosity and roughness of the surface of the film which favours adsorption of more oxygen on the surface of the photodetector. The photogenerated holes recombined with the trapped electrons, increasing the concentration of photogenerated electrons in the conduction band enhancing the photocurrent (I_(on) ~ 0.02 mA) of the Cu:ZnO photodetector.
机译:研究了溶胶-凝胶法合成的铜掺杂ZnO(Cu:ZnO)薄膜的紫外光电导性。纯铝氧化物薄膜和1.3 at。的Cu:ZnO薄膜紫外光电探测器的响应特性。已经研究了在5 V下偏置λ= 365 nm的紫外辐射和强度= 24μwatt/ cm〜2的wt%Cu掺杂。与纯基于ZnO薄膜的光电探测器(K = 4.9×10〜 1,T_(90%)= 41s)。 X〜射线衍射(XRD)和拉曼光谱证实了Cu〜(2+)离子已被ZnO晶格取代,从而降低了暗电流(I_(off)〜1.44 nA)。在紫外线照射下,由于膜表面的高孔隙率和粗糙度,在光电探测器中会产生更多的电子空穴对,这有利于在光电探测器的表面上吸附更多的氧气。光生空穴与俘获的电子重新结合,增加了导带中光生电子的浓度,从而增强了Cu:ZnO光探测器的光电流(I_(on)〜0.02 mA)。

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  • 会议地点 Boston MA(US)
  • 作者单位

    Department of Physics and Astrophysics, University of Delhi, Delhi, INDIA;

    Department of Physics and Astrophysics, University of Delhi, Delhi, INDIA;

    Department of Physics, St.Stephens College, University of Delhi, Delhi, INDIA;

    Department of Physics and Astrophysics, University of Delhi, Delhi, INDIA;

    Physics Department, Miranda house, University of Delhi, Delhi, INDIA;

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