Dynamic X-ray lithography for blazed diffractive optics fabrication

摘要

Application of dynamic X-ray lithography for originating of continuous-relief diffractive optical elements and microoptics has been investigated. The method is based on action of X-ray irradiation passed through fixed X-ray mask with triangle-like openings to periodically moved PMMA wafer. PMMA samples were exposed on synchrotron radiation facility VEPP-3 (BINP SB RAS, Novosibirsk) and then etched in liquid developer to form surface relief. Advances and limitations of the method have been discussed. Application of dynamic X-ray lithography with moving wafer to fabrication of gradient diffractive optical elements in PMMA wafer has been demonstrated.