ETRI, 218 Gajeong-ro, Youseong, Daejon 34129, Korea;
Mobrick Co. Ltd., 218 Gajeong-ro, Youseong, Daejeon 34129, Korea;
Marine-Integrated Bionics Center, Pukyoung National University, Busan 48513, Korea;
Marine-Integrated Bionics Center, Pukyoung National University, Busan 48513, Korea;
Marine-Integrated Bionics Center, Pukyoung National University, Busan 48513, Korea,Interdisciplinary Program of Biomedical Mechanical Electrical engineering, Pukyong National University, Busan 48513, Korea;
Hanbat National University, College of Construction, Environment and Design, 125 Dongseo-daero, Yuseong-gu, Deajeon 34158, Korea;
vanadium oxides; phase change; metal-insulator transition; thin-film;
机译:VO_2薄膜在77 K至300 K之间金属-绝缘体转变的电触发研究
机译:Cr掺杂VO_2薄膜中金属-绝缘体转变温度的电学和光学表征
机译:M1-相VO_2和M_2-相VO_2:Cr薄膜包覆的微悬臂梁的相变行为
机译:VO_2薄膜的相分析及vo_2电触发金属 - 绝缘子过渡的机理
机译:非化学计量,铬和钛掺杂的钒氧化物薄膜中的金属-绝缘体过渡。
机译:SmNiO3应变薄膜的金属-绝缘体转变:结构电和光学性质
机译:无结构的一阶金属绝缘子过渡观察 VO_2中的相变