Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University, A.-Einstein-Str. 15, 07745 Jena, Germany;
Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University, A.-Einstein-Str. 15, 07745 Jena, Germany;
Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University, A.-Einstein-Str. 15, 07745 Jena, Germany;
Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University, A.-Einstein-Str. 15, 07745 Jena, Germany,Fraunhofer Institute of Applied Optics and Precision Mechanics IOF, A.-Einstein-Str. 7, 07745 Jena, Germany;
antireflection structure; Black Silicon; infrared optics; effective media; reactive ion etching; self-organization;
机译:自组织,有效的中等黑硅,用于红外减反射
机译:MWIR区域(3.6-4.9μm)的高效抗反射涂层同时对锗和硅光学器件有效
机译:多层有效介质近似方法,通过原位Mueller矩阵椭偏法测量氧化铝钝化的高多孔硅纳米结构薄膜的环境效应
机译:中红外线硅光学自组织,有效的中型黑色硅抗反射结构
机译:通过硅28(极化质子,极化质子)硅28极化转移研究核介质中有效NN相互作用
机译:互补硅亚波长减反射光栅(SWARG)结构的LWIR传输性能的数值和实验研究
机译:通过原位穆勒基质椭圆形测量测量的氧化铝钝化高度多孔硅纳米结构薄膜环境效应的多层有效介质近似方法