'/> Multiple-layered effective medium approximation approach to modeling environmental effects on alumina passivated highly porous silicon nanostructured thin films measured by in-situ Mueller matrix ellipsometry
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Multiple-layered effective medium approximation approach to modeling environmental effects on alumina passivated highly porous silicon nanostructured thin films measured by in-situ Mueller matrix ellipsometry

机译:多层有效介质近似方法,通过原位Mueller矩阵椭偏法测量氧化铝钝化的高多孔硅纳米结构薄膜的环境效应

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摘要

Graphical abstract Display Omitted Highlights Optical changes in alumina passivated highly porous silicon from SCTFs during controlled exposure to toluene vapor are reported. Inspection of individual Mueller matrix elements show sensitivity to adsorption. Adsorption of toluene into void region between nanostructures cannot be described with a single inhomogeneous layer. Multiple-layer effective medium approximation approach is necessary. Abstract Optical changes in alumina passivated highly porous silicon slanted columnar thin films during controlled exposure to toluene vapor are reported. Electron-beam evaporation glancing angle deposition and subsequent atomic layer deposition are utilized to deposit alumina passivated nanostructured porous silicon thin films. In-situ Mueller matrix generalized spectroscopic ellipsometry in an environmental cell is then used to determine changes in optical properties of the nanostructured thin films by inspection of individual Mueller matrix elements, each of which exhibit sensitivity to adsorption. The use of a multiple-layered effective medium approximation model allows for accurate description of the inhomogeneous nature of toluene adsorption onto alumina passivated highly porous silicon slanted columnar thin films.
机译: 图形摘要 < ce:simple-para id =“ spar0005” view =“ all” /> 省略显示 突出显示 < ce:para id =“ p0005” view =“ all”>氧化铝钝化高光的光学变化报告了在受控的甲苯蒸气暴露过程中来自SCTF的多孔硅。 对单个Mueller矩阵元素的检查显示出对吸附的敏感性。 无法用单个不均匀层来描述甲苯吸附到纳米结构之间的空隙区域中。 必须使用多层有效介质近似方法。 摘要 < ce:abstract-sec id =“ abst0015” view =“ all”> 在受控暴露于甲苯的过程中,氧化铝钝化的高多孔硅斜柱状薄膜的光学变化蒸气被报告。利用电子束蒸发掠角沉积和随后的原子层沉积来沉积氧化铝钝化的纳米结构多孔硅薄膜。然后,通过检查单个的Mueller矩阵元素(每个元素都表现出对吸附的敏感性),使用环境单元中的原位Mueller矩阵广义椭圆偏振光谱法确定纳米结构薄膜的光学特性变化。使用多层有效介质近似模型可以准确描述甲苯吸附到氧化铝钝化的高度多孔的硅倾斜柱状薄膜上的不均匀性质。 < / ce:抽象>

著录项

  • 来源
    《Applied Surface Science》 |2017年第ptab期|663-666|共4页
  • 作者单位

    Department of Electrical and Computer Engineering, University of Nebraska – Lincoln,Center for Nanohybrid Functional Materials, University of Nebraska – Lincoln;

    Department of Electrical and Computer Engineering, University of Nebraska – Lincoln,Center for Nanohybrid Functional Materials, University of Nebraska – Lincoln;

    Department of Mechanical and Materials Engineering, University of Nebraska – Lincoln,J.A. Woollam Co., Inc;

    J.A. Woollam Co., Inc;

    Department of Electrical and Computer Engineering, University of Nebraska – Lincoln,J.A. Woollam Co., Inc;

    Department of Electrical and Computer Engineering, University of Nebraska – Lincoln,Center for Nanohybrid Functional Materials, University of Nebraska – Lincoln;

    Department of Electrical and Computer Engineering, University of Nebraska – Lincoln,Center for Nanohybrid Functional Materials, University of Nebraska – Lincoln,Leibniz Institute for Polymer Research,Department of Physics, Chemistry, and Biology, Linköping University;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Porous silicon; Ellipsometry; Mueller matrix; Adsorption; In-situ;

    机译:多孔硅椭偏法穆勒矩阵吸附原位;
  • 入库时间 2022-08-18 03:05:05

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