Abstract: In this paper a number of cluster tool concepts will be analyzed to compare numbers such as throughput, cycle time and cost per wafer. This will be done for two of the most frequently used reactor concepts, viz. for single wafer and batch type reactors, and for a number of ambient control concepts. For demonstration purposes, a polysilicon gate process flow will be used, as the process steps involved belong in the class of critical processes in advanced CMOS manufacturing lines.!1
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