首页> 外文会议>Microelectronics (MIEL), 2012 28th International Conference on >Short channel effects in double gate polycrystalline silicon SLS ELA TFTs
【24h】

Short channel effects in double gate polycrystalline silicon SLS ELA TFTs

机译:双栅极多晶硅SLS ELA TFT中的短沟道效应

获取原文
获取原文并翻译 | 示例

摘要

Short channel effects in double gate poly-Si SLS ELA TFTs are studied in this work by electrically characterizing devices with varying top gate length and constant bottom gate length. The electrical parameters were extracted for different bottom gate biases, observing a Vth increase with increasing channel length, attributed to more traps present within larger channels. This was also probed through the increase of Vg,max-Vth with increasing channel length. In order to distinguish between short channel effects and possible Ltop/Lbottom effects, devices with different bottom gate lengths and a constant top gate length were also studied. No similar trends as in the case of decreasing channel length were observed, thus supporting our case that the previously observed behavior is mainly an effect of channel shrinking and not of Ltop/Lbottom effects.
机译:通过对具有变化的顶栅长度和恒定的底栅长度的器件进行电特性分析,研究了双栅多晶硅SLS ELA TFT中的短沟道效应。针对不同的底栅偏置提取电参数,观察到Vth随着沟道长度的增加而增加,这归因于较大沟道中存在更多的陷阱。这也通过增加Vg,max-Vth随通道长度的增加来探究。为了区分短沟道效应和可能的Ltop / Lbottom效应,还研究了具有不同底栅长度和恒定顶栅长度的器件。没有观察到与减小通道长度的情况类似的趋势,因此支持了我们的情况,即先前观察到的行为主要是通道收缩的影响,而不是Ltop / Lbottom的影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号