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Highly reliable 1Mbit ferroelectric memories with newly developed BLT thin films and steady integration schemes

机译:具有新开发的BLT薄膜和稳定集成方案的高度可靠的1Mbit铁电存储器

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Highly reliable packaged 1Mbit ferroelectric memories with 0.35 μm CMOS ensuring ten-year retention and imprint at 175 °C have been successfully developed for the first time. These excellent reliabilities have resulted from newly developed BLT ferroelectric films with superior performance and steady integration schemes free from attacks of process impurities.
机译:高度可靠的封装1Mbit铁电存储器,可确保在175°C的10年保留和印记中,首次成功开发了10年的保留和印记。这些优异的可靠性由新开发的BLT铁电薄膜具有卓越的性能和稳定的集成方案,免于过程杂质的攻击。

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