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Growth of InAs Quantum Dots in a Metamorphic InGaAs Bottom Cell of an Inverse Metamorphic Solar Cell

机译:INAS量子点在逆变质太阳能电池变质IngaAs底部细胞中的生长

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State-of-the-art triple junction inverse metamorphic solar cells have been known to have bottom InGaAs junction that are limiting to the overall radiation performance. It has been proposed that the addition of quantum dots to the bottom junction would improve radiation tolerance of the bottom cell, and thus enhance the triple junctions overall performance in high dose applications. A significant amount of development has been made on quantum dots in metamorphic InGaAs for laser applications, however to date little work has been accomplished for photovoltaic devices. For this study we evaluate the growth of InAs quantum dots on In_(0.31)GaAs grown metamorphically on GaAs. Simulations show that the addition of 50 layers of quantum dots to the bottom junction increases the expected efficiency by 0.2% at a dose of 1x10~(12) protons/cm~2, however this would be a larger increase at a higher dose or if the bottom cell were current limiting. Evaluating the formation by atomic force microscopy with a height of 2.5 nm and density of approximately 7.8x10~(10) dots/cm~2. Temperature dependent photoluminescence measurements were completed to extract an activation energy of 84.6 meV, which corresponds with the calculated electron confinement in the quantum dot.
机译:已知最先进的三界逆变质太阳能电池具有限制整体辐射性能的底部InGaAs结。已经提出,向底部结的量子点加入底部结的辐射耐受性,从而提高高剂量应用中的总体性能。对于激光应用的变质IngaAs中的量子点,已经对大量开发进行了大量的开发,但到目前为止,对于光伏器件已经完成了较少的工作。对于这项研究,我们评估INAS量子点上的INAS量子点的增长在GaAs上的逐渐生长的GaAs。仿真表明,在1×10〜(12)质子/ cm〜2的剂量下,将50层量子点加入到底部结的预期效率将预期效率增加0.2%,但这将在更高剂量或较高的剂量增加底部电池是限流。通过原子力显微镜评估形成,高度为2.5nm,密度为约7.8x10〜(10)点/ cm〜2。完成温度依赖性光致发光测量以提取84.6meV的激活能量,其对应于量子点中的计算电子限制。

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