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Opto-electrical properties of p-SnSe:S/N-Si heterojunction for solar cell application

机译:太阳能电池用p-SnSe:S/N-Si异质结的光电特性

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Pure SnSe thin film and doped with S at different percentage (0,3,5,7)% were deposited from alloy by thermal evaporation technique on glass substrate at room temperature with 400±20nm thickness. The influences of S dopant ratio on characterization of SnSe thin film Nano crystalline was investigated by using Atomic force microscopy(AFM), X-ray diffraction (XRD), energy dispersive spectroscopy (EDS), Hall Effect measurement, UV-Vis absorption spectroscopy to study morphological, structural, electrical and optical properties respectively. The XRD showed that all the films have polycrystalline in nature with orthorhombic structure, with preferred orientation along (111)plane. These films was manufactured of very fine crystalline size in the range of (18.167-51.126)nm, depending on the S ratio doping, the results of AFM indicated that these films were Nano crystalline with grain size (60.12-84.25)nm. Direct band gap values with range(1.5-1.68)eV were gotten from optical absorption measurements. I-V characteristics for p- SnSe:S/n-Si heterojunctions show the efficiency of solar cell increase with increase doping ratio and the highest value at films doped with ratio (7%S). C-V measurements show that all junctions were an abrupt type.
机译:采用热蒸发技术,在室温下,在玻璃衬底上制备了不同(0,3,5,7)%掺硫量的纯SnSe薄膜,薄膜厚度为400±20nm。采用原子力显微镜(AFM)、X射线衍射(XRD)、能谱仪(EDS)、霍尔效应测量、紫外-可见吸收光谱等方法研究了S掺杂比对SnSe薄膜纳米晶表征的影响,并对其形貌、结构、电学和光学性质进行了研究。XRD分析表明,所有薄膜均为多晶,具有正交结构,沿(111)面择优取向。这些薄膜的晶粒尺寸在(18.167-51.126)nm范围内非常细,这取决于掺杂的S比。AFM结果表明,这些薄膜是晶粒尺寸为(60.12-84.25)nm的纳米晶体。从光吸收测量中获得了范围为(1.5-1.68)eV的直接带隙值。p-SnSe:S/n-Si异质结的I-V特性表明,太阳能电池的效率随着掺杂比的增加而增加,在掺杂比为7%S的薄膜上达到最高值。C-V测量表明,所有连接都是突变型。

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