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Raman spectroscopy estimation of the carrier concentration and the value of strain in monolayer graphene films grown on 4H-SiC

机译:在4H-SiC中生长的单层石墨烯薄膜载体浓度的拉曼光谱估计和菌株的菌株

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Comprehensive study of high-quality monolayer graphene samples grown by thermal destruction of the Si-face of the 4H-SiC substrate was carried out. Analysis of the data obtained by Raman spectroscopy and angle-resolved photoemission spectroscopy suggest the need to use the Fermi velocity in the graphene layer under study to obtain a correct estimate of the electron concentration and strain values using Raman data. This statement is valid not only for graphene on the SiC substrate, but for graphene on any other substrate as well, since the Fermi velocity in graphene depends on the dielectric constant of the substrate.
机译:进行了通过热破坏4H-SiC衬底的Si-面的高质量单层石墨烯样品的综合研究。 通过拉曼光谱和角度分辨的光曝光光谱获得的数据的分析表明需要在研究中使用Fermi速度的需要,以获得使用拉曼数据的正确估计电子浓度和应变值。 该陈述不仅适用于SiC基板上的石墨烯,而且对于任何其他基板的石墨烯也是有效的,因为石墨烯中的费米速度取决于基板的介电常数。

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