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Effect of iron intercalation on graphene/SiC electronic structure

机译:铁嵌入对石墨烯/ SIC电子结构的影响

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Graphene-based materials are of great interest for spintronics devices. In the present paper, the effect of intercalated iron on the electronic structure of the graphene/4H-SiC(0001) system has been studied in the frame of density functional theory. It is shown that the most energetically favorable position of intercalated Fe atoms corresponds to their location between the buffer layer and the top Si layer of the substrate. Insertion of Fe atoms into the system leads to the spin polarization of the electronic states of carbon. Another effect is that the buffer layer becomes flat and bilayer graphene forms in the system.
机译:基于石墨烯的材料对熔点的设备具有很大的兴趣。 在本文中,研究了密度函数理论框架中研究了嵌入铁对石墨烯/ 4H-SiC(0001)系统的电子结构的影响。 结果表明,嵌入的Fe原子的最能良好的位置对应于它们在基板的缓冲层和顶部Si层之间的位置。 将Fe原子插入系统导致碳电子状态的自旋极化。 另一种效果是缓冲层在系统中变平和双层石墨烯形式。

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