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Photoluminescence spectrum Dependences on Temperature and Excitation power in InAs Quantum dots embedded in InGaAs/GaAs Quantum wells

机译:光致发光谱依赖于InaAs / GaAs量子阱嵌入InAS量子点的温度和激励力

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The photoluminescence (PL), its temperature and excitation power dependences have been studied in the symmetric In_(0.15)Ga_(1-0.15)As/GaAs quantum wells (QWs) with embedded InAs quantum dots (QDs), obtained with the variation of the QD growth temperature (470-535°C). The increase of QD growth temperatures is accompanied by the enlargement of the QD lateral sizes (from 12 up to 28 nm) and by the shift non monotonously of the PL peak positions. The fitting procedure has been applied for the analysis of the temperature dependences of PL peaks. The obtained fitting parameters testify that in studied QD structures the process of In/Ga inter diffusion between QDs and capping/buffer layers takes place. The intensity of the In/Ga inter diffusion depends on the density and the size of QDs in studied QD structures. Additionally the In/Ga intermixing influent essentially on the dependence of the integrated PL intensity versus excitation power.
机译:已经在与嵌入式INAS量子点(QDS)中的对称IN_(0.15)GA_(QWS)中研究了光致发光(0.15)GA_(QWS)的对称IN_(0.15)GA_(1-0.15)。 QD生长温度(470-535°C)。 QD生长温度的增加伴随着QD横向尺寸(从12到28nm)的扩大,并且通过偏移非单调的PL峰位置。拟合程序已被应用于分析PL峰的温度依赖性。所获得的拟合参数作证,在研究中,QD结构在QD和覆盖/缓冲层之间的In / Ga间扩散的过程发生。 IN / GA间扩散的强度取决于研究QD结构中QD的密度和尺寸。另外,IN / GA混合基本上影响了集成PL强度与激励力的依赖性。

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