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Carrier Mobility as a Function of Temperature in as-Grown and H-intercalated Epitaxial Graphenes on 4H-SiC

机译:载流子迁移率作为4H-SiC上生长和H嵌入的外延图形的温度的函数

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The carrier velocity is measured as a function of electric field in as-grown and H-intercalaed epitaxial graphene grown on semi-insulating 4H-SiC in order to estimate the low field carrier mobility as a function of temperature. The mobility is also measured on the same samples as a function of temperature in a liquid Helium (He) cooled cryostat. The two temperature dependent measurements are compared in order to deduce the dominant carrier scattering mechanisms in both materials. In as-grown material, acoustic phonon scattering and impurity scattering both contribute, while impurity scattering dominates in H-intercalated material.
机译:作为在半绝缘4H-SiC上生长的生长和H型外延石墨烯中的电场的函数测量载流器,以估计作为温度的函数的低场载流子迁移率。在与液氦(HE)冷却的低温恒温器中的温度的函数上也测量迁移率。比较两个温度依赖的测量,以便在两种材料中推导出显着的载体散射机制。在以生长的材料中,声学声子散射和杂质散射两者贡献,而杂质散射在H嵌入材料中占主导地位。

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