首页> 外文会议>Conference on Silicon Carbide and Related Materials >Applications of Vapor-Liquid-Solid Selective Epitaxy of Highly p-type Doped 4H-SiC: PiN Diodes with Peripheral Protection and Improvement of Specific Contact Resistance of Ohmic Contacts
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Applications of Vapor-Liquid-Solid Selective Epitaxy of Highly p-type Doped 4H-SiC: PiN Diodes with Peripheral Protection and Improvement of Specific Contact Resistance of Ohmic Contacts

机译:高效掺杂4H-SIC:引脚二极管蒸汽液 - 固体选择性外延的应用及欧姆触点的特定接触电阻的销二极管

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This work deals with two applications of the Selective Epitaxial Growth of highly p-type doped buried 4H-SiC in Vapor-Liquid-Solid configuration (SEG-VLS). The first application is the improvement of the Specific Contact Resistance (SCR) of contacts made on such p-type material. As a result of the extremely high doping level, SCR, values as low as.1.3 × 10~(-6)?.cm~2 have.been demonstrated. Additionally, the high Al concentration of the SEG-VLS 4H-SiC material induces a lowering of the Al acceptor ionization energy down to 40 meV. The second application is the fabrication of PiN diodes with SEG-VLS emitter and,guard-rings peripheral protection. Influence of some process parameters and crystal orientation on the forward and reverse characteristics of the PiN diodes is discussed.
机译:该工作涉及两种应用的高p型掺杂掩埋4H-SiC的选择性外延生长在蒸汽 - 液体固体构型(SEG-VLS)中。第一个应用是改善在这种p型材料上制备的触点的特定接触电阻(SCR)。由于极高的掺杂水平,SCR,值低至1.3×10〜(-6)的值。CM〜2具有。表现出来。另外,SEG-VLS 4H-SIC材料的高Al浓度会使Al受体电离能量降低至40meV。第二种应用是用SEG-VLS发射器的引脚二极管制造,以及防护环外围保护。讨论了一些工艺参数和晶体取向对引脚二极管的前向和反向特性的影响。

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