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Terahertz transmission properties of VO_2 thin films deposited on c- and m-plane sapphire substrates by pulsed laser deposition

机译:通过脉冲激光沉积沉积在C和M平面蓝宝石基板上的VO_2薄膜的Terahertz传动特性

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Vanadium dioxide (VO_2) films were grown on c- and m-plane sapphire substrates by pulsed laser deposition (PLD) technique with VO_2 ceramic target. The VO_2 films with preferred growth orientation and uniform dense distribution have been achieved on both substrates, as confirmed by X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM). The terahertz (THz) transmission properties of VO_2 thin films were studied by terahertz time-domain spectroscopy (THz-TDS). The results indicate that the THz transmission properties of VO_2 films are strongly influenced by the sapphire substrate orientation, suggesting that VO_2 films are ideal material candidates for THz modulation.
机译:通过VO_2陶瓷靶通过脉冲激光沉积(PLD)技术在C和M平面蓝宝石基板上生长二氧化钒(VO_2)薄膜。在两种基材上已经实现了具有优选生长取向和均匀致密分布的VO_2膜,如X射线衍射(XRD)和场发射扫描电子显微镜(Fe-SEM)所证实。通过Terahertz时域光谱(THZ-TDS)研究了VO_2薄膜的太赫兹(THz)传递性能。结果表明,VO_2薄膜的THz传输性能受到蓝宝石衬底取向的强烈影响,表明VO_2薄膜是THz调制的理想材料候选。

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