Deposition Condition for High Crystalline Fraction of Yttria-Stabilized Zirconia (YSZ) Films Deposited by Reactive Sputtering at Room Temperature

摘要

It was found that the target surface condition is very important in controlling O- ions formation during the sputtering in order to deposit highly crystallized YSZ films. In the presentation, investigation results about other deposition conditions will be shown and discussed for higher Xc of YSZ film.