Structural Analysis of Ni-Doped SrTiO_3: XRD Study

摘要

The aim of this work is to study the structure of Ni-doped SrTiO_3 thin films by X-ray diffraction (XRD). All samples were prepared by magnetron sputtering on Si and Si02 substrates. The main objective of this work is to monitor the crystallization of the deposited thin layer of Ni-doped SrTiO_3. The X-ray diffraction measurements were done on the films as deposited and after annealing in vacuum up to 900°C. The x-ray analysis was used with both geometries (symmetric and asymmetric). Those measurements allow us to get information about the influence of Ni on the final structure, the size of crystallites, the micro-strains and the deformation of the lattice. In particular, here we domonstarate that Ni doping lead to the unique stabilisation of crystall growth of SrTi03 as compared to the undoped SrTiO_3.