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Doping concentration effect on performance of single QW double-heterostructure InGaN/AlGaN light emitting diode

机译:掺杂浓度对单QW双异质结构Ingan / AlGaN发光二极管性能的影响

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Light emitting diode (LED) employed a numerous applications such as displaying information, communication, sensing, illumination and lighting. In this paper, InGaN/AlGaN based on one quantum well (1QW) light emitting diode (LED) is modeled and studied numerically by using COMSOL Multiphysics 5.1 version. We have selected In_(0.06)Ga_(0.94)N as the active layer with thickness 50nm sandwiched between 0.15μm thick layers of p and n-type Al_(0.15)Ga_(0.85)N of cladding layers. We investigated an effect of doping concentration on InGaN/AlGaN double heterostructure of light-emitting diode (LED). Thus, energy levels, carrier concentration, electron concentration and forward voltage (IV) are extracted from the simulation results. As the doping concentration is increasing, the performance of threshold voltage, Vth on one quantum well (1QW) is also increases from 2.8V to 3.1V.
机译:发光二极管(LED)采用许多应用,例如显示信息,通信,感测,照明和照明。在本文中,通过使用COMSOL Multiphysics 5.1版本进行模拟和研究基于一个量子阱(1QW)发光二极管(LED)的IngaN / AlGaN。我们选择了In_(0.06)Ga_(0.94)n作为厚度50nm的有源层,夹在0.15μm的p和n型Al_(0.15)Ga_(0.85)n的覆层层之间。我们研究了掺杂浓度对发光二极管(LED)的IngaN / AlGaN双异质结构的影响。因此,从模拟结果中提取能量水平,载流子浓度,电子浓度和正向电压(IV)。随着掺杂浓度的增加,阈值电压的性能,一个量子阱(1QW)上的Vth也从2.8V增加到3.1V。

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