Copper doped TiO_2 thin films were prepared onto glass substrates at a substrate temperature of about 450°C and annealed at 550 °C for 2 hours by Spray Pyrolysis technique. The prepared thin films were characterized by X-ray diffraction, Scanning electron microscope and also subjected to UV-Vis studies in order to characterize the structural property, surface morphology and optical properties. The diffraction peaks from XRD were indicates that the structural property (Anatase phase) for un doped and Copper doped TiO_2 thin films. The results showed that at doping the intensity of (101) plane decreased which may be due to mobility of Titanium and Oxygen atoms which leads to reduction in the nucleation of crystallisation phase of anatase TiO_2. The SEM structure revealed a uniform and evenly distributed grains across the substrate surface. Bandgap calculated from UV-Vis spectra.
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