XPS Study of Plasma Modified PVDF-TrFE Films Surface

摘要

The impact of surface plasma modification on PVDF-TrFE film with different exposure time was investigated using X-ray photoelectron spectroscopy (XPS). The main emphasis of this study was to optimize the exposure time of argon plasma on the surface of PVDF-TrFE films The surface of spin coated PVDF-TrFE film was modified with argon plasma at exposure time of 1, 3, 5, 7 and 9 min/s. Prior to modification, only small amount of atomic percent (1.92 %) of O1s peak was observed at 540.8 eV, but upon modification, the atomic percent for O1s peak was found to increase to 8.8%. Meanwhile, the atomic percent for F1s peak observed at 695.3 eV was found to decrease from 70.6% to 61.2%. This phenomenon is an indication that plasma modified PVDF-TrFE films were readily oxidized. Importantly, most of the fluorine elements were removed from the modified PVDF-TrFE film surface, which rendered the film favourable for adhesion with other material for coating aplications.