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Study of the Electrical Contact Properties of Monolayer MoS_2/Si Heterojunction

机译:单层MOS_2 / SI异质结的电接触性能研究

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We present the study of the electrical contact properties of monolayer MoS_2/Si in terms of semiconductor heterojunctions theory. It shows that the carrier concentration increases in exponential form with temperature, then gradually arrived to its saturation. Additionally, the energy band structures of monolayer MoS_2/n, p-Si heterojunctions have been developed before and after contacting. And the work functions of MoS_2 and Si, barrier height of the junctions have been investigated. The barrier height linearly increases with the carrier density in Si. Finally, we simulated the voltage-current property of the monolayer MoS_2/n, p-Si heterojunctions in terms of thermal diffused theory of semiconductor.
机译:我们在半导体异质结理论方面介绍了单层MOS_2 / SI的电接触性能。结果表明,载流子浓度随温度的指数形式增加,然后逐渐到达其饱和度。另外,在接触之前和之后开发了单层MOS_2 / N,P-Si异质结的能带结构。并研究了MOS_2和Si的作用功能,路口的屏障高度已经进行了研究。屏障高度随着载体密度在Si中线性增加。最后,我们模拟了Monolayer MOS_2 / N,P-SI异质结的电压 - 在热扩散理论的半导体的杂交理论中。

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