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Near edge X-ray absorption fine structure study of Zn_(0.8)Mg_(0.2)O thin films

机译:近边缘X射线吸收细结构研究Zn_(0.8)Mg_(0.2)O薄膜

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We report the local electronic structure study of Zn_(0.8)Mg_(0.2)O thin films using x-ray absorption spectroscopy. The films were deposited on p-Si (100) substrates by sol-gel method and then annealed in O_2 ambient for 1 hour. X-ray diffraction (XRD) confirmed the single phase wurtzite structure with a (002) preferred orientation. The near edge x-ray absorption fine structure (NEXAFS) spectrum collected at Ο K-edge indicates the presence of some oxygen vacancies in the film. The NEXAFS at Mg K-edge confirms the Mg doping into ZnO lattice. Zn L_3-edge spectra feature reflects no Zn defect related features.
机译:我们通过X射线吸收光谱报告Zn_(0.8)Mg_(0.2)薄膜的本地电子结构研究。通过溶胶 - 凝胶法在P-Si(100)底物上沉积薄膜,然后在O_2环境中退火1小时。 X射线衍射(XRD)证实单相抗晶钛矿结构具有(002)优选的取向。在Ω边缘收集的近边缘X射线吸收细结构(NEXAFS)谱表示薄膜中存在一些氧空位。 Mg K-Edge的Nexafs确认Mg掺杂到ZnO格子中。 Zn L_3-Edge Spectra功能反映了没有相关的Zn缺陷。

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