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A study of DNA combing speed in fabricating Nanochannel ElectroPoration (NEP) chips

机译:纳米通道电穿孔(NEP)芯片制备DNA梳理速度的研究

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Electroporation through nanochannels has potential as a useful tool for cell transfection. This potential is due to: the low voltage required;;the centralized distribution of the potential penetration;;the fact that this method causes no harm to the cell membrane, and;;the even expression pattern of the target gene after electroporation. Additionally, the stable production process and improved yield rate can reduce the cost of producing the nanochannels and thus make the commercialization of this technique more feasible. This study aims to investigate the relationship between the speed of DNA stretching and the yield rate of nanochannels. We found that when the length of nanochannels is 2 ìm, the yield rate can exceed 90% at a stretching speed of 2.3 mm/s . With a similarly high yield rate, longer nanochannels (3 ìm) displayed a wider range of stretching speed. We have determined that the stretching speed can influence the adhesion of DNA and the subsequent fabrication of nanochannels. Therefore, this speed must be appropriately controlled.
机译:通过纳米通道电穿孔具有潜力作为细胞转染的有用工具。这种潜力是由于所需的低电压;;集中分布潜在渗透;这项方法对细胞膜造成危害的事实,;;电穿孔后靶基因的均匀表达模式。另外,稳定的生产过程和提高的产量率可以降低生产纳米的成本,从而使该技术的商业化更加可行。本研究旨在探讨DNA拉伸速度与纳米槽的屈服率之间的关系。我们发现,当纳米槽的长度为2μm时,屈服率可以以2.3mm / s的拉伸速度超过90%。具有同样高的屈服率,较长的纳米通道(3ìm)显示更广泛的拉伸速度。我们已经确定拉伸速度可以影响DNA的粘附和随后的纳米纳米制造。因此,必须适当地控制这种速度。

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