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Rate equation model of bulk optical damage of silica, and the influence of polishing on surface optical damage of silica

机译:硅胶散态抗损伤的速率方程模型,抛光对二氧化硅表面滤光损伤的影响

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Our objective is to understand the mechanism that generates catastrophic optical damage in pulsed fiber amplifiers. We measured optical damage thresholds of bulk fused silica at 1064 nm for 8 ns and 14 ps pulses. The 8 ns pulse is single longitudinal mode from a Q-switched laser, and the 14 ps pulse is from a Q-switched mode-lock laser. The beams in both cases are TEMoo mode, and they are focused to a 7.5 μm spot inside a fused silica window. The pulse-to-pulse energy variations are 1% for 8 ns pulses and 5% for 14 ps pulses. Under these conditions optical damage is always accompanied by plasma formation at the focal spot; we found the damage threshold fluences are 3854 ± 85 J/cm~2 for the 8 ns pulses and 25.4 ±1.0 J/cm~2 for the 14 ps pulses. These fluences are corrected for self focusing. Both damage thresholds are deterministic, in contrast to the claim often made in the literature that optical damage is statistical in the nanosecond range.The measured damage threshold fluences for 8 ns and 14 ps pulses do not fit a square root of pulse duration scaling rule. We interpret the damage in terms of plasma formation initiated by multiphoton ionization and amplified by an electron avalanche. The damage threshold irradiance can be matched with a simple rate equation model that includes multiphoton ionization, electron avalanche, and electron-hole recombination. The damage morphologies are dramatically different in the nanosecond and picosecond cases because of the large difference in deposited energy. However, both morphologies are reproducible from pulse to pulse. We also measured surface damage thresholds for silica windows polished by different methods. We find that cerium oxide polished surfaces damage at approximately 40% of the bulk threshold, with a large statistical spread. Surfaces prepared using an Al_2O_3 polish damaged between 50% and 100% of the bulk damage limit, with a substantial fraction at 100%. Surfaces polished using first the Al_2O_3 polish and then an SiO_2 polish exhibit surface damage values equal to the bulk damage value at nearly every point. We also measured damage thresholds for different sized focal spots. Some earlier reports have claimed that damage thresholds depend strongly on the size of the focal spot, but we find the surface threshold is independent of the spot size.
机译:我们的目的是了解在脉冲光纤放大器中产生灾难性光学损伤的机制。我们测量了在1064nm的块状熔融二氧化硅的光学损伤阈值,对于8 ns和14 ps脉冲。 8NS脉冲是来自Q开关激光的单个纵向模式,并且14ps脉冲来自Q开关模式锁定激光器。两种情况下的光束是TemoO模式,它们集中在熔融二氧化硅窗口内的7.5μm。脉冲到脉冲能量变化为1%,对于8 ns脉冲,14 ps脉冲为5%。在这些条件下,光学损坏总是伴随着焦点的等离子体形成;我们发现损伤阈值流量为8 ns脉冲的3854±85 j / cm〜2,为14 ps脉冲25.4±1.0 j / cm〜2。这些流利被纠正了自我聚焦。与通常在文献中的索赔中的索赔相反,滤光损伤在纳秒范围内统计学的统计阈值相反。8 ns和14 ps脉冲的测量损伤阈值流量不适合脉冲持续时间缩放规则的平方根。我们在多相电离引发的血浆形成方面解释损伤,并由电子雪崩扩增。损伤阈值辐照度可以与简单的速率等式模型匹配,其包括多选电离,电子雪崩和电子 - 空穴重组。由于沉积能量的差异较大,纳秒和皮秒壳体在纳秒和皮秒壳中的损伤形态差异。然而,两种形态从脉冲再现是可重复的。我们还测量了不同方法抛光的二氧化硅窗的表面损伤阈值。我们发现氧化铈抛光表面损坏大约40%的批量阈值,具有大的统计扩展。使用Al_2O_3抛光制备的表面在50%至100%的散装损伤极限之间受损,其大部分为100%。使用第一AL_2O_3抛光抛光的表面,然后在几乎每一点上表现出SIO_2波兰的表面损伤值等于散装损伤值。我们还测量了不同尺寸的焦点的损伤阈值。一些早期的报告已声称,损坏阈值强烈依赖于焦点的大小,但发现表面阈值与点尺寸无关。

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