机译:基于KOH的浅蚀刻,用于曝光地下损伤和熔融二氧化硅光学表面的激光损伤阻力
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China;
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China;
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China;
School of Materials Science and Engineering Southwest University of Science and Technology Mianyang 621010 PR China;
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China;
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China;
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China;
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China;
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China;
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China;
Research Center of Laser Fusion China Academy of Engineering Physics Mianyang 621900 PR China|IFSA Collaborative Innovation Center Shanghai Jiao Tong University Shanghai 200240 PR China;
Fused silica; KOH; Laser-induced damage; Surface defect; Wet etching;
机译:结合反应离子刻蚀和动态化学刻蚀以提高熔融石英光学表面的耐激光损伤性
机译:抛光引起的表面杂质缺陷对熔融石英光学元件抗激光损伤的影响以及用HF酸腐蚀去除
机译:抛光诱导的地下杂质缺陷对熔融二氧化硅光学激光损伤性的影响及其用HF酸蚀刻去除
机译:通过去除熔融二氧化硅中的地下损伤来提高表面损伤阻力
机译:熔融石英中的高功率激光损坏。
机译:划痕的熔融石英表面对紫外线激光引起的损坏的抵抗力
机译:抛光诱导的地下杂质缺陷对熔融二氧化硅光学激光损伤性的影响及其用HF酸蚀刻去除