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Method of making of high purity fused silica having high resistance to optical damage, and high purity fused silica
Method of making of high purity fused silica having high resistance to optical damage, and high purity fused silica
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机译:具有高抗光学损伤性的高纯度熔融二氧化硅的制造方法以及高纯度熔融二氧化硅
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摘要
The invention relates to the production of high purity fused silica glass which is highly resistant to optical damage by ultraviolet radiation in the laser wavelength of about 300 nm or shorter. In particular, this invention relates to an fused silica optical member or blank which exhibits substantially no optical damage up to 107 pulses (350mJ/cm2) at the KrF laser wavelength region of about 248 nm, and at the ArF laser wavelength region of about 193 nm. IMAGE
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机译:本发明涉及高纯度熔融石英玻璃的生产,该玻璃对在约300nm或更短的激光波长中的紫外线辐射具有高度的抵抗性。特别地,本发明涉及一种熔融石英光学部件或毛坯,其在约248nm的KrF激光波长区域和在ArF下,直至10 7个脉冲(350mJ / cm 2)基本不显示光学损伤。激光波长区域约为193 nm。 <图像>
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