Photoresist Free Negative and Positive Photolithographic Deposition of Zirconium Oxide Films from Photosensitive Metal Organic Compounds

摘要

Photoresist free photolithographic deposition of zirconium oxide from photosensitive zirconium complexes has been achieved using photochemical metal organic deposition. In this contribution, the deposition of patterned zirconium oxide is used as an example to demonstrate both negative and positive photolithographic deposition. In the prototypical deposition of zirconium oxide by photochemical metal organic deposition, a solution containing zirconium (IV) di-n-butoxide bis(2,4-pentanedionate) was used to spin coat a silicon substrate, resulting in an amorphous film. The film was then exposed to UV light leading to the formation of zirconium oxide and other volatile products. The resultant zirconium oxide film was investigated by X-ray diffraction and Auger Electron Spectroscopy. Irradiating the precursor film through a photo mask led to a latent image which yielded either a negative or a positive pattern dependent upon developer. Subject to further photochemical or thermal treatment, a zirconium oxide pattern can be obtained. Similar results were obtained using a series of zirconium (IV) complexes. Both positive and negative patterns of zirconium oxide with 2 micron feature sizes were obtained.