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Effect of source temperature on the electrical transport, microstructural and optical properties of tin monosulfide thin films prepared by close spaced sublimation method

机译:通过闭合间隔升华法制备锡硫醚薄膜电输电,微观结构和光学性能的影响

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Tin monosulfide (SnS) thin films were prepared by close spaced sublimation method at three different source temperatures of 550, 575 and 600°C. Structural, textural and compositional features were investigated by XRD, SEM, EDS and Raman spectroscopy. From absorption spectra, direct band gap increased from 1.18 to 1.23 eV with increasing source temperature. Electrical resistivity, Hall constant, carrier concentration and mobility values of the films prepared at source temperature of 600°C were 0.54 Ω.cm, 40.76 cm~3/C, 1.53x10~(17) and 75.48 cm~2/(V.s), respectively. The temperature-dependent conductivity was performed in the temperature range of 50-300 K. It was shown that three types of conduction mechanisms can be expected: thermionic emission passing through grain boundary at high temperature range (240-300 K), the Mott variable-range hopping (Mott-VRH) at low temperature range (135-235 K) and the Efros-Shklovskii variable-range hopping (ES-VRH) at very low temperature range (80-130 K).
机译:通过在550,575和600℃的三种不同源极温度下闭合间隔升华法制备锡硫化物(SNS)薄膜。通过XRD,SEM,EDS和拉曼光谱研究了结构,纹理和组成特征。从吸收光谱,直接带隙随着源极温度的增加,从1.18增加到1.23eV。电阻率,霍尔恒定,载体浓度和在源极温度为600℃的薄膜的迁移率值为0.54Ω.cm,40.76cm〜3 / c,1.53x10〜(17)和75.48cm〜2 /(Vs) , 分别。在50-300k的温度范围内进行温度依赖性电导率。显示,可以预期三种类型的传导机构:通过高温范围(240-300 k),通过晶界通过晶界的热离子发射。 - 在低温范围(135-235 k)和efros-shklovskii可变范围跳跃(ES-VRH)处的跳跃(MOTT-VRH)(80-130 k)。

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