首页> 外文会议>PRiME Joint International Meeting of the Electrochemical Society, the Electrochemical Society of Japan, and the Korean Electrochemical Society >Wafer-Level Hermetic Seal Bonding at Low-Temperature with Sub-Micron Gold Particle Using Stencil Printing
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Wafer-Level Hermetic Seal Bonding at Low-Temperature with Sub-Micron Gold Particle Using Stencil Printing

机译:使用模版印刷用亚微米金颗粒在低温下粘接晶片级气密密封

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Wafer-level low-temperature hermetic seal bonding has been successfully demonstrated using sub-micron-size gold particles (0.3 μm mean diameter) with adopting a narrow-width rim structure to reduce the required total bonding force down to the range available on commercial wafer bonders. Conventional stencil printing combined with a newly developed suspended metal mask was employed as a cost-effective fabrication method to form sealing lines over the rim structure. Au-Au thermo-compression bonding using 10 μm-wide rim structure was performed at 200°C for 30 minutes with the bonding pressure of 200 MPa. An excellent hermeticity was achieved and the encapsulated pressure inside the sealed cavity was estimated to be around 100 Pa.
机译:使用亚微米尺寸的金颗粒(0.3μm平均直径)成功地证明了晶片级低温气密密封键合,采用窄宽度边缘结构,以将所需的总粘合力降低到商业晶圆上可用的范围粘结器。与新开发的悬浮金属掩模结合的传统模版印刷作为成本有效的制造方法,以在边缘结构上形成密封线。使用10μm宽边缘结构的Au-Au热压缩键合在200℃下进行30分钟,键合压力为200MPa。实现了优异的气密性,并且估计密封腔内的包封压力约为100pa。

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