首页> 外文会议>International Conference on High-Performance Ceramics >The Influence of Al_2O_3 and TiO_2 Additions on the Sintering Behavior of Partial Reaction Bonding Silicon Nitride
【24h】

The Influence of Al_2O_3 and TiO_2 Additions on the Sintering Behavior of Partial Reaction Bonding Silicon Nitride

机译:Al_2O_3和TiO_2的影响对部分反应键合氮化硅的烧结行为

获取原文

摘要

To compare the influence of Al_2O_3 and TiO_2 on the sintering behavior of partial reaction bonding silicon nitride (RBSN) and post densification behavior, different amounts of Al_2O_3 or TiO_2 have been added into Si-Si_3N_4-Y_2O_3 system. The results indicated that a high amount of Al_2O_3 addition inhibited the reaction bonding process, a lower nitridation degree was obtained, while TiO_2 has limited influence on nitridation, only slightly decreased nitration degree with increasing TiO_2 addition. After post sintered at 180CC, a density ranging from 2.31 to 3.09g/cm~3 were obtained with additions of Al_2O_3 and TiO_2, much larger than the one without them. The linear shrinkage of post-sintered samples was strongly promoted with high Al_2O_3 content, but it was irrelevant with the amount of TiO_2. The highest bending strength of 523MPa can be obtained with addition of 6wt% Al_2O_3. TiO_2 transformed into TiN which located at grain boundary interfaces, restraining the grain growth of β-Si_3N_4 and leading to an inferior flexural strength after post sintered at 1800°C.
机译:为了比较Al_2O_3和TiO_2对部分反应粘合氮化硅(RBSN)的烧结行为的影响以及后致密化行为,已添加不同量的Al_2O_3或TiO_2中,加入Si-Si_3N_4-Y_2O_3系统中。结果表明,高量的Al_2O_3加法抑制反应键合过程,获得较低的氮化度,而TiO_2对氮化有限,仅略微降低硝化度随着TiO_2的增加。在180cc下烧结后,通过添加Al_2O_3和TiO_2获得的密度为2.31至3.09g / cm〜3,远远大于没有它们的1。用高Al_2O_3含量强烈促进烧结后样品的线性收缩,但与TiO_2的量无关。通过添加6wt%的Al_2O_3,可以获得523MPa的最高弯曲强度。 TiO_2转化为位于晶界界面的锡,限制β-Si_3N_4的晶粒生长,并在1800℃下烧结后导致较差的弯曲强度。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号