首页> 外文会议>International Conference on High-Performance Ceramics >The Influence of Al_2O_3 and TiO_2 Additions on the Sintering Behavior of Partial Reaction Bonding Silicon Nitride
【24h】

The Influence of Al_2O_3 and TiO_2 Additions on the Sintering Behavior of Partial Reaction Bonding Silicon Nitride

机译:Al_2O_3和TiO_2添加对部分反应粘合氮化硅烧结行为的影响

获取原文

摘要

To compare the influence of Al_2O_3 and TiO_2 on the sintering behavior of partial reaction bonding silicon nitride (RBSN) and post densification behavior, different amounts of Al_2O_3 or TiO_2 have been added into Si-Si_3N_4-Y_2O_3 system. The results indicated that a high amount of Al_2O_3 addition inhibited the reaction bonding process, a lower nitridation degree was obtained, while TiO_2 has limited influence on nitridation, only slightly decreased nitration degree with increasing TiO_2 addition. After post sintered at 180CC, a density ranging from 2.31 to 3.09g/cm~3 were obtained with additions of Al_2O_3 and TiO_2, much larger than the one without them. The linear shrinkage of post-sintered samples was strongly promoted with high Al_2O_3 content, but it was irrelevant with the amount of TiO_2. The highest bending strength of 523MPa can be obtained with addition of 6wt% Al_2O_3. TiO_2 transformed into TiN which located at grain boundary interfaces, restraining the grain growth of β-Si_3N_4 and leading to an inferior flexural strength after post sintered at 1800°C.
机译:比较上部分反应结合的氮化硅(RBSN)和后致密化行为的烧结行为Al_2O_3的与TiO_2的影响,不同量或Al_2O_3的的TiO_2的已被添加到Si的Si_3N_4-Y_2O_3系统。结果表明,加入Al_2O_3的具有高量抑制反应键合工艺,获得低的氮化程度,而的TiO_2对氮化影响有限,仅仅是略微降低硝化程度随的TiO_2加法。后在180CC,密度范围从2.31到3.09克烧结后/厘米〜3 Al_2O_3的与TiO_2的添加,一个比没有他们大得多获得。后烧结的样品的线性收缩是紧密联系在一起的高含量Al_2O_3的促进,但它是不相关的TiO_2与的量。 523MPa的高弯曲强度可与另外6%重量的Al_2O_3的获得。的TiO_2转化成的TiN其中,位于晶界界面,抑制β-Si_3N_4的晶粒生长和后在1800℃下烧结后,导致较差的挠曲强度。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号