Reversible deformation in hybrid organic-inorganic photoresists processed by ultrafast direct laser write technique

摘要

We report on reversible deformation in photoresist structures patterned using femtosecond direct laser write technique. Significant swelling and shrinkage of exposed features by up to 10% in negative-tone hybrid organic-inorganic Zr containing photoresist SZ2080 were found to occur during wet development and rinse following the laser processing. Amount of swelling and shrinkage is controllable within 10% margin via use of different rinse agents and the shrinkage-swelling cycle can be repeated many times. Simple interpretation of this phenomenon is presented, and several potential application areas in diffractive optics, micro mechanics, actuation, and environmental sensing are outlined.