首页> 外文会议>International Congress on Ceramics >Photoswitching Characteristics of LsNbO_3/ZnO/n-Si Heterojunction
【24h】

Photoswitching Characteristics of LsNbO_3/ZnO/n-Si Heterojunction

机译:LSNBO_3 / ZnO / N-Si异质结的Photoswitching特性

获取原文

摘要

(001)-oriented LiNbO_3 (LN) ferroelectric films were grown on (100)-oriented n-type Si substrates using 15 nm-thick ZnO layers as buffers by pulse laser deposition technique and the LN/ZnO/n-Si heteroj unctions were fabricated. Obvious photoswitching characteristics to white light were observed when the reverse voltages were applied on the LN/ZnO/n-Si heterojunction. High performance was exhibited, such as a large ON/OFF ratio, short photoresponse time, steady ON or OFF states, and well reversible. The results were discussed in terms of the band diagrams of the LN/ZnO/Si heteroj unctions in this work.
机译:(001) - 使用15nm厚的ZnO层在(100)的N型Si衬底上生长铁电膜,作为脉冲激光沉积技术的缓冲液,LN / ZnO / N-Si heteroj Unoctions是缓冲剂制作。当在LN / ZnO / N-Si异质结上施加反向电压时,观察到白色光的明显光度接近特性。表现出高性能,例如大的开/关比,光响应时间短,稳定的状态,良好的可逆。结果在这项工作中的LN / ZnO / Si heteroj Unce句的带图方面讨论。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号