Magnetron Sputtering Target Structure Optimization Research Status

摘要

In order to optimize the target surface magnetic field intensity and uniformity for the purpose, this paper introduces the traditional magnetron sputtering target problems, the author summarizes the other researchers on magnetron sputtering target field overall optimization ideas, magnetic field simulation method and different target under the condition of the magnet structure optimization, especially in rectangular target end area optimization are summarized, and the magnetron sputtering target magnetic field pole shoe and permeability piece optimization also made a description.