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First-principles study of migration mechanisms and diffusion of carbon in GaN

机译:甘蓝迁移机制的第一原理研究

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Carbon related defects are readily incorporated in GaN due to its abundance during growth both with MBE and CVD techniques. Employing first-principles calculations we compute the migration barrier of neutral carbon interstitials in the wurtzite GaN crystal. The Minimum Energy Path (MEP) and the migration barriers of these defects are obtained using the Nudged Elastic Band (NEB) method with the climbing image modification (CI-NEB). In addition, the Dimer method is used to verify the results. The results yield a quantitative description of carbon diffusion in the crystal allowing for the determination of the most probable migration paths.
机译:由于其在MBE和CVD技术的生长期间,碳相关缺陷容易掺入GaN中。采用第一原理计算,我们计算紫立岩GaN晶体中中性碳间质型的迁移屏障。使用具有攀爬图像改性(CI-NEB)的亮的弹性带(NEB)方法获得这些缺陷的最小能量路径(MEP)和迁移屏障。此外,DIMOR方法用于验证结果。结果产生晶体中的碳扩散的定量描述,允许确定最可能的迁移路径。

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