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Effect of Annealing on Proton Irradiated AlGaN/GaN based micro-Hall sensors

机译:退火对质子辐照的AlGaN / GaN基微厅传感器的影响

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The effect of annealing at 673 K on irradiated micro-Hall sensors irradiated with protons at 380keV and fluences of 10~(14), 10~(15) and 10~(16) protons/'cm~2 is reported. Cathodoluminescence measurements were carried out at room temperature before and after annealing and showed improvement in the band edge band emission of the GaN layer. After annealing a sensor irradiated by 10~(13) protons/cm~2 the device became operational with improvements in its magnetic sensitivity. All irradiated sensors showed improvement in their electrical characteristics after annealing.
机译:报道了在380KeV下照射质子的照射微厅传感器的673k的效果,并报告了10〜(14),10〜(15)和10〜(16)质子/'cm〜2的流量。 在退火之前和之后在室温下进行阴极发光测量,并在GaN层的带边缘发射中显示出改善。 在退火后,通过10〜(13)质子/ cm〜2照射的传感器,该器件变得可操作,随着其磁敏度的改善。 所有辐照传感器都显示出退火后的电气特性的改善。

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