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Ultrasonic vibration assisted polishing of micro-structured surfaces on SiC ceramics

机译:超声波振动辅助SiC陶瓷微结构表面抛光

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摘要

In consideration of increasing the MRR and improving the micro-structured surface quality, ultrasonic vibration assisted polishing (UVAP) of micro-structured surfaces on SiC is proposed in this paper. The experimental results shown that when compared with conventional polishing, the MRR can be improved from 34.67 nm·min~(-1) to 44.28 nm·min~(-1) in depth. Meanwhile, the polished surface roughness of microstructures is improved to 16.5nm (Ra) by a factor of 2 over the conventionally abrasive polished (AP) surface. In addition, there are no subsurface cracks can be found in the UVAP SiC micro-structures.
机译:考虑到提高MRR并提高微结构化表面质量,本文提出了SiC上微结构表面的超声波振动辅助抛光(UVAP)。实验结果表明,与常规抛光相比,MRR可以从34.67nm·min〜(-1)到44.28nm·min〜(-1)深度。同时,在常规磨料抛光(AP)表面上,微观结构的抛光表面粗糙度改善为16.5nm(Ra)。此外,在UVAP SIC微结构中没有地下裂缝没有地下裂缝。

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