首页> 外文会议>International Silicon‐Germanium Technology and Device Meeting >Strain-induced morphological instability and self assembly of tin wires during controlled annealing of Geinf0.83/infSninf0.17/inf epitaxial film on Ge(001) substrate
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Strain-induced morphological instability and self assembly of tin wires during controlled annealing of Geinf0.83/infSninf0.17/inf epitaxial film on Ge(001) substrate

机译:Ge 0.83的控制退火过程中锡线的形态不稳定性和自组装.GE(001)衬底上的外延膜

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摘要

Formation of Sn wires on Ge0.83Sn0.17 layer during annealing was discovered. The phenomenon observed may be explained by surface undulation, Sn segregation and aggregation.
机译:发现了在退火期间在GE0.83SN0.17上形成SN导线。观察到的现象可以通过表面波动,Sn偏析和聚集来解释。

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