LOW-COST NANO-MANUFACTURING OF SURFACE ACOUSTIC WAVE DEVICES BY USE OF JET FLASH NANO IMPRINT LITHOGRAPHY

摘要

A nanoimprint lithography techniqu has been used to developed a SAW manufacturing techniqu, which can reduce the fabrication tolerances by a factor 10, paving the way for low noise communication components and calibration free sensors. The techniqu utilizeses Jet and Flash Imprint Lithography (J-FIL), which is a UV step and flash nanoimprint techniqu. Through this techniqu combined with an optimized dry etching development and lift-off process, metallic interdigitated transducer structures with feature variations less than 5 nm are demonstrating, showing the high fidelity patterning capabilities of the JFIL techniqu. The end goal is to demonstrate a full pilot production with fabrication tolerances below 10 ppm, which will pave the way for cheap, high performance SAW components for the next generation.