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DENDRITIC GROWTH FROM CHEMICAL CONTAMINATION AND PARTIAL CLEANING: FUNDAMENTAL TESTS AND APPLICATION STUDY

机译:从化学污染和部分清洁的树突生长:基本测试和应用研究

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Electronic assemblies are building in more functionality using fine pitch leadless components. A reduction in the distance between conductive paths, coupled with challenging operating environments make these assemblies particularly sensitive to electrochemical migration and corrosions effects. These failure modes are strongly impacted by various sources of chemical contamination from the board, components, assembly materials and even the process. Flux residues trapped under low stand-off components with large form factors are of particular concern for their potential to promote dendritic growth and corrosion effects, as well as the difficulty to remove them quantitatively from the system. The purpose of this study is to analyze at a fundamental level the impact of various chemical residues on dendritic growth and corrosion of conductive traces and to correlate these electrochemical effects with real-life application conditions. For this purpose, a non-standard test board enables the quantification of the dendritic growth kinetics between Y-shaped traces, in function of the chemical residue characteristics and environmental conditions. This test is complemented by the application of traditional electrochemical techniques (Electrochemical Impedance Spectroscopy, Linear Polarization Resistance) to measure the fundamental corrosion parameters of each chemical package. The classification of the fluxes in terms of their corrosion and electrochemical migration (e.g dendritic growth) rate and potential will then be correlated with SIR and ECM experiments executed on populated printed circuit boards, where the fluxes are trapped under various surface mount components. These boards are assembled with standard industrial equipment and processes, and submitted to various cleaning conditions using a state of the art in-line cleaner. This study generates a useful body of knowledge for the design of robust fluxes, assembly processes and testing methods for the production of reliable assemblies operating in challenging environments.
机译:电子组件在使用细间距无线组件的更多功能中构建。导电路径之间的距离减小,与具有挑战性的操作环境相结合,使得这些组件对电化学迁移和腐蚀效应特别敏感。这些故障模式受电路板,组件,装配材料甚至该过程的各种化学污染源的影响。在具有大形状因子的低脱扣组件下捕获的助熔剂残留物特别关注其促进树突生长和腐蚀效应的潜力,以及从系统中定量地移除它们的难题。本研究的目的是分析各种化学残留物对树枝状生长和导电痕迹腐蚀的影响,并将这些电化学作用与现实寿命的应用条件相关。为此目的,非标准测试板能够定量Y形迹线之间的树突生长动力学,其具有化学残留物特征和环境条件。该测试通过应用传统电化学技术(电化学阻抗光谱,线性偏振电阻)来互补,以测量各化学包的基本腐蚀参数。然后在其腐蚀和电化学迁移(例如树突生长)速率和电位方面的助熔剂分类与在填充的印刷电路板上执行的SIR和ECM实验相关,其中助焊剂被捕获在各种表面安装部件下。这些电路板用标准工业设备和工艺组装,并使用现有技术在线清洁剂提交给各种清洁条件。本研究为在充满挑战环境中运行的可靠组件的生产的强大助熔剂,装配过程和测试方法设计了一个有用的知识。

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