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DENDRITIC GROWTH FROM CHEMICAL CONTAMINATION AND PARTIAL CLEANING: FUNDAMENTAL TESTS AND APPLICATION STUDY

机译:化学污染和部分清洁引起的树突生长:基础测试和应用研究

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Electronic assemblies are building in more functionality using fine pitch leadless components. A reduction in the distance between conductive paths, coupled with challenging operating environments make these assemblies particularly sensitive to electrochemical migration and corrosions effects. These failure modes are strongly impacted by various sources of chemical contamination from the board, components, assembly materials and even the process. Flux residues trapped under low stand-off components with large form factors are of particular concern for their potential to promote dendritic growth and corrosion effects, as well as the difficulty to remove them quantitatively from the system. The purpose of this study is to analyze at a fundamental level the impact of various chemical residues on dendritic growth and corrosion of conductive traces and to correlate these electrochemical effects with real-life application conditions. For this purpose, a non-standard test board enables the quantification of the dendritic growth kinetics between Y-shaped traces, in function of the chemical residue characteristics and environmental conditions. This test is complemented by the application of traditional electrochemical techniques (Electrochemical Impedance Spectroscopy, Linear Polarization Resistance) to measure the fundamental corrosion parameters of each chemical package. The classification of the fluxes in terms of their corrosion and electrochemical migration (e.g dendritic growth) rate and potential will then be correlated with SIR and ECM experiments executed on populated printed circuit boards, where the fluxes are trapped under various surface mount components. These boards are assembled with standard industrial equipment and processes, and submitted to various cleaning conditions using a state of the art in-line cleaner. This study generates a useful body of knowledge for the design of robust fluxes, assembly processes and testing methods for the production of reliable assemblies operating in challenging environments.
机译:电子组件使用细间距无铅元件来构建更多功能。缩短导电路径之间的距离,再加上具有挑战性的工作环境,使这些组件对电化学迁移和腐蚀效应特别敏感。这些故障模式会受到电路板,组件,组装材料乃至过程中各种化学污染源的强烈影响。捕获在具有大形状因数的低隔离成分下的助焊剂残留物特别有可能引起它们促进树突状生长和腐蚀的作用,以及难以从系统中定量地去除它们。这项研究的目的是从根本上分析各种化学残留物对树枝状生长和导电迹线腐蚀的影响,并将这些电化学效应与实际应用条件相关联。为此,非标准测试板可以根据化学残留特征和环境条件对Y形迹线之间的树突生长动力学进行量化。该测试辅以传统电化学技术(电化学阻抗谱,线性极化电阻)的应用,以测量每个化学包装的基本腐蚀参数。然后根据助焊剂的腐蚀和电化学迁移(例如树突状生长)速率和电势对助焊剂进行分类,然后将其与在组装好的印刷电路板上执行的SIR和ECM实验相关联,在这些实验中,助焊剂被困在各种表面贴装元件下。这些板通过标准的工业设备和工艺进行组装,并使用最先进的在线清洁器进行各种清洁条件。这项研究为鲁棒通量的设计,装配工艺和测试方法提供了有用的知识,以生产在挑战性环境中运行的可靠装配。

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